VIGO Photonics

VIGO Photonics is a European manufacturer of epitaxial wafers and instruments for photonics and microelectronics, specialized in MWIR and LWIR detectors and modules, produced with the use of internally-developed technology. The mission of VIGO Photonics is to provide fast and convenient, easy to use IR detectors at any wavelength from 2 to 16 µm, reaching fundamental BLIP limits without cryocooling. VIGO Photonics has a complete front – end and back- end production line for semiconductor high capacity instruments – from epitaxy of II-IV and III-V groups, through detector chips, lasers and their assembly and integration with electronics. The techniques used for manufacturing photonics components are following: – MOCVD – for production HgCdTe MWIR and LWIR detectors and detection modules, – MBE – for production InAs and InAsSb RoHS compliant MWIR and LWIR detectors and detection modules, – MOCVD – for production of III-V semiconductor materials for photonic and micro-electronic applications. The technique used for manufacturing HgCdTe detectors is the metalorganic chemical vapour deposition (MOCVD) method. The molecular beam epitaxy (MBE) growth technology is used for manufacturing bulk InAs, InAsSb and superlattice (SL) InAs/InAsSb detectors. The Planetary Reactor MOCVD is used for manufacturing GaAs or InP based high-quality III-V epitaxial structures for photonic devices (VCSELs, QCLs, photodetectors) and microelectronic devices (diodes, transistors) and others. Since January 2015 is a President of the Board of VIGO Photonics S.A.