GenISys GmbH

We provide flexible, high-performance software solutions for the optimization of micro and nano fabrication as well as metrology and inspection, to give engineers, manufacturers, and tool suppliers unparalleled efficiency and optimal value in research, development, and production of future nano technologies. Driven by the strong demand of e-beam equipment manufacturers and users for a dedicated data preparation solution , Ulrich Hofmann and Nezih Ünal started GenISys GmbH in 2005 to serve equipment vendors and end-users with fast development and highly dedicated service. GenISys is a young company based in Taufkirchen - Munich serving a nieche in the semiconductor design flow segment - home in a global market and working across borders in order to achieve the best customer value. Our customers push the boundaries to deliver new technologies to the world. They trust us in making their technologies stronger - with high-performance products, top-quality and dedicated support. BEAMER, introduced in 2006, has become the de-facto standard for e-beam direct write pattern processing. Our 3D lithography simulation software LAB, first introduced for proximity lithography, has become a key enabler for the flat panel display industry. MASKER is a mask data preparation software package optimized for highest productivity and quality especially for masks in the application areas of displays, photonics, IoT and special devices.