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Vistec Semiconductor Systems, Inc
Jena, Germany
A
51-100 Employees
1996
Key takeaway
Vistec Electron Beam GmbH specializes in advanced electron-beam lithography, offering cutting-edge technology that ensures high accuracy and productivity, making it ideal for prototyping and low-volume manufacturing. Their 50kV Variable Shaped Beam lithography systems cater to the semiconductor industry and emerging markets.
Highlighted product
Core business
electron beam lithography: Vistec - We understand E-Beam.
elektronenstrahllithographie Jena
STS-Elionix
Wellesley, United States
B
51-100 Employees
-
Key takeaway
STS-Elionix specializes in advanced nanotechnology products, prominently featuring Elionix electron beam lithography (EBL) systems designed for high precision and speed, catering to the needs of research institutions and industry. Their expertise highlights a commitment to the development and service of EBL systems, essential for applications in nanofabrication and quantum device production.
Highlighted product
Core business
Electron Beam Lithography Systems | Nanofabrication of Quantum Devices
STS-Elionix is a partnership that provides electron beam lithography systems to leading research institutions, national labs, and private companies.
aBeam Technologies
Hayward, United States
B
11-50 Employees
2003
Key takeaway
The company offers simulation tools that enhance the understanding and optimization of electron interactions with materials, which is highly relevant to electron beam lithography. Additionally, they provide products that optimize etching and metrology for masks, further supporting the lithography process.
Highlighted product
Core business
Electron Beam Lithography
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Eulitha
Kirchdorf (BE), Switzerland
A
1-10 Employees
2006
Key takeaway
Eulitha is a leading provider of innovative nano-lithography technologies, focusing on enhancing the performance and efficiency of photonic devices. Their expertise in high-quality lithography solutions positions them as a key player in the photonics manufacturing sector.
Highlighted product
Core business
Eulitha
Lithography for Photonics. Eulitha provides nanolithography services and equipment for research and production.
EULITHA AG
Kirchdorf (BE), Switzerland
A
11-50 Employees
2006
Key takeaway
Eulitha specializes in innovative nano-lithography technologies that enhance the performance and efficiency of photonic devices. As a leader in high-quality lithography solutions for photonics manufacturing, Eulitha is well-equipped to support the evolving needs of the photonics market.
Highlighted product
Core business
Lithography for photonics - EULITHA
Beamfox Technologies ApS
Copenhagen, Denmark
A
1-10 Employees
2016
Key takeaway
Beamfox Technologies specializes in developing software solutions that address the challenges of electron beam lithography, particularly the proximity effect that can lead to unwanted exposures and deformed nanostructures. Their product, Beamfox Proximity, offers a user-friendly interface for state-of-the-art proximity effect correction, enhancing the precision and reliability of high-resolution nanofabrication.
Highlighted product
Product
Beamfox - Technology - Electron-beam lithography and proximity effects
Electron-beam lithography is the state-of-the-art method for high-resolution nanofabrication. With an electron beam waist of less than a nanometer, intricate nanoscale patterns can be written in electron-sensitive resists. Unfortunately, the electrons scatter off the resist and the substrate, which results in unwanted exposures known as proximity effect errors. An example is a grating within an exposed region as shown to the right. If a constant exposure time is applied (BEFORE, blue region), the actual electron dose varies dramatically across the device and the result shown in the SEM image shows detrimental device failure.
Multibeam
United States
B
11-50 Employees
2010
Key takeaway
Multibeam specializes in multi-column electron-beam lithography (MEBL) systems that facilitate maskless production of integrated circuits (ICs). Their technology enables the creation of nanoscale patterns on silicon, making it ideal for applications like on-chip security and rapid prototyping.
Highlighted product
Core business
Home - Multibeam
Multibeam engages in the design, manufacture, and sales of multi-column electron-beam lithography (MEBL) systems that enable maskless production of integrated circuits (ICs) for numerous applications including on-chip security, rapid prototyping, heterogeneous chiplet integration, silicon photonics, and other emerging applications.
EM Analytical
Adlington, United Kingdom
A
11-50 Employees
2017
Key takeaway
The company offers advanced lithography and nanofabrication services, including electron beam lithography, which is suitable for applications ranging from semiconductors to microfluidics. They provide support and training for both experienced users and novice researchers.
Highlighted product
Service
Lithography and nanofabrication - EM Analytical
Advanced lithography and nanofabrication for rapid prototyping and proof-of-principle devices. Suitable for everything from semiconductors to microfluidics.
Applied NanoTools
Edmonton, Canada
A
1-10 Employees
2002
Key takeaway
Applied Nanotools Inc. utilizes a state-of-the-art 100 keV electron beam lithography system, enabling the manufacture of devices with feature sizes as small as 60 nm. This advanced lithography technique supports their rapid turnaround prototyping and low-to-mid volume production capabilities.
Highlighted product
Core business
Applied Nanotools Inc.
E-BEAM Services
Lebanon, United States
B
101-250 Employees
1985
Key takeaway
E-BEAM Services specializes in electron beam technology and is the largest contract electron beam provider in the U.S. They support customers throughout the product development process, from experimental design to high-volume production, highlighting their expertise in enhancing products that contribute to various industries, including energy and healthcare.
Highlighted product
Service
Electron Beam & Product Development Services | E-BEAM Services
E-BEAM assists you at every phase of new product development, from experiment design to intepreting results that lead to high-volume production.
Technologies which have been searched by others and may be interesting for you:
Electron Beam Lithography (EBL) is a microfabrication technique used to create extremely fine patterns on various substrates. This method employs a focused beam of electrons to write custom designs onto a resist material, which is then developed to create nanoscale structures. EBL is known for its high resolution and precision, making it ideal for applications in semiconductor manufacturing, nanotechnology, and materials science. The process allows for the fabrication of intricate features that are difficult to achieve with traditional photolithography. EBL can produce patterns with resolutions down to a few nanometers, enabling advancements in electronics and photonics. As a result, it plays a crucial role in the development of next-generation devices and integrated circuits.
Electron Beam Lithography (EBL) is a high-resolution technique used to create patterns on a substrate, typically for semiconductor fabrication. In this process, a focused beam of electrons is directed onto a specially coated surface, often covered with a resist material. The interaction between the electrons and the resist changes the solubility of the resist in certain areas, allowing for selective removal of material. This technique operates under a vacuum to prevent scattering of electrons by air molecules, ensuring precision in patterning. After exposure, the substrate undergoes a development process, where the exposed or unexposed resist is removed, revealing the desired pattern. EBL is favored for its ability to produce extremely fine features, making it ideal for applications in nanotechnology and integrated circuit manufacturing.
Electron Beam Lithography (EBL) is widely utilized in the field of nanotechnology for various applications.
1. Semiconductor Manufacturing
EBL plays a crucial role in the fabrication of semiconductor devices, enabling the creation of intricate patterns on wafers with high precision. This accuracy is essential for the development of advanced integrated circuits.
2. Nanostructure Fabrication
In research and development, EBL is used to fabricate nanostructures for applications in photonics and quantum computing. The ability to create nanoscale patterns facilitates the exploration of new materials and devices.
3. MEMS and NEMS
Micro-electromechanical systems (MEMS) and nano-electromechanical systems (NEMS) benefit from EBL technology as it allows for the detailed patterning of components, which enhances device performance and miniaturization.
4. Research and Development
EBL is a valuable tool in academic and industrial research settings, supporting the creation of prototypes and experimental devices. Its versatility enables scientists to test novel concepts in various technological fields.
1. High Resolution
Electron Beam Lithography (EBL) offers exceptional resolution capabilities, allowing for the fabrication of intricate patterns at the nanoscale. This precision is crucial for advanced applications in semiconductor manufacturing and nanotechnology.
2. Flexibility
The technology supports a wide range of materials and substrates, providing the flexibility to create custom patterns tailored to specific needs. This adaptability makes EBL suitable for both research and industrial applications.
3. Direct Write Capability
EBL enables direct writing of patterns without the need for masks, significantly reducing the time and cost associated with mask fabrication. This feature is particularly beneficial for prototyping and low-volume production runs.
4. High Throughput Potential
With advancements in EBL technology, high throughput can be achieved, making it more efficient for larger production volumes. This improvement helps bridge the gap between traditional lithography methods and the speed required in modern manufacturing.
5. Capability for Complex Structures
The ability to create complex three-dimensional structures is a significant advantage of EBL. This capability opens up new avenues in the development of advanced materials and devices, particularly in the fields of microelectronics and photonics.
Electron Beam Lithography (EBL) requires several key pieces of equipment to achieve precise patterning at the nanoscale. A scanning electron microscope (SEM) is essential, as it directs a focused beam of electrons onto the substrate. The electron beam source generates high-energy electrons, which are crucial for the lithography process. Additionally, an exposure stage is necessary to hold the substrate in place and allow for accurate alignment. To develop the patterns, a developer system is used post-exposure. Finally, a vacuum system is important to minimize electron scattering and ensure optimal performance during the lithography process.
Some interesting numbers and facts about your company results for Electron Beam Lithography
| Country with most fitting companies | United States |
| Amount of fitting manufacturers | 8045 |
| Amount of suitable service providers | 6859 |
| Average amount of employees | 11-50 |
| Oldest suiting company | 1985 |
| Youngest suiting company | 2017 |
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Some interesting questions that has been asked about the results you have just received for Electron Beam Lithography
What are related technologies to Electron Beam Lithography?
Based on our calculations related technologies to Electron Beam Lithography are Industrial Electroplating, Industrial Filtration, Industrial Sintering, Industrial Extrusion, Industrial Handling
Which industries are mostly working on Electron Beam Lithography?
The most represented industries which are working in Electron Beam Lithography are Other, Electronics and Electrical engineering, IT, Software and Services, Manufacturing, Machinery Manufacturing
How does ensun find these Electron Beam Lithography Companies?
ensun uses an advanced search and ranking system capable of sifting through millions of companies and hundreds of millions of products and services to identify suitable matches. This is achieved by leveraging cutting-edge technologies, including Artificial Intelligence.
