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Billerica, United States
11-50 Employees
2000
Our mission is to elongate the life of scanning electron microscopes (SEMs) worldwide through our maintenance and refurbishing services. Our vision is to establish a worldwide distribution channel with an expertise in electron beam technologies and a focus on total customer satisfaction. SEMTech Solutions (STS), incorporated in 2000, has sold hundreds of electron beam products to the scanning electron microscopy (SEM) industry. Our main emphasis is the refurbishment and service of scanning electron microscopes (SEMs) worldwide. We have manufacturing facilities in Massachusetts, Michigan and California. Our flagship product, the SEMView8000 – a SEM operator control console, upgrades any SEM column with a WIN10 platform; this product allows customers to continue utilizing their existing tools and ensure they remain current with evolving technology. We believe that a strong partnership between our value chain and our customers is paramount to our continued success. This focus enables us to build strong, trusting relationships with customers, leading to our mutual success.
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EBL Calibration and Sample Holder for SEMs | SEMTech Solutions
... Electron Beam Lithography ...
Copenhagen, Denmark
1-10 Employees
2016
The story of Beamfox began in 2014 when Leonardo Midolo and Søren Stobbe were developing novel quantum nanocomponents at the Niels Bohr Institute in Copenhagen. Beamfox Technologies develops and commercializes software solutions for proximity effect correction in the R&D market. Beamfox Proximity provides a simple and user-friendly interface to our state-of-the-art proximity effect correction algorithm. Beamfox Proximity provides state-of-the-art proximity effect correction for electron-beam lithography in a user-friendly software package. Beamfox Proximity is the most user-friendly proximity effect correction solution on the market and integrates seamlessly with electron-beam writers from Elionix Inc., Raith systems compatible with the CSF format, and supports all electron-beam writers through layered GDS. Although electron-beam lithography is the state-of-the-art method for high-resolution lithography, the method is inherently limited by backscattering of electrons, leading to unwanted exposures and deformed nanostructures. In 2016, Leonardo and Søren teamed up with Anders Esbensen and founded Beamfox Technologies to develop our first product: Beamfox Proximity. Leonardo is a young scientist and entrepreneur with a passion for nanotechnology, photonics, and software.
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Beamfox - Technology - Electron-beam lithography and proximity effects
... Electron-beam lithography is the state-of-the-art method for high-resolution nanofabrication. With an electron beam waist of less than a nanometer, intricate nanoscale patterns can be written in electron-sensitive resists. Unfortunately, the electrons scatter off the resist and the substrate, ...
Hayward, United States
11-50 Employees
2003
Our products include simulation tools to understand and optimize electron interactions with materials, electron scattering, charging, heating, energy deposition, etc. Other products optimize chrome etch and metrology for masks. The company manufactures custom test chips and has a variety of off-the-shelf test chips.The sizes are from 5 mm to 300 mm wafers.
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Electron Beam Lithography
... Electron Beam Lithography ...
Philadelphia, United States
1-10 Employees
2019
See Program: University of Chicago hosts MAEBL 2023 September 12-14, 2023. Conferencing information will be provided the day prior via email. MAEBL's vision is simple: To be the professional networking platform and an educational provision of the electron beam lithography community. MAEBL brings together the brightest minds in electron beam lithography throughout North America. Inspiration is born from community engagement. MAEBL gives the electron beam lithography community a voice--a chance to connect and learn from one another, promoting innovation of the core patterning science in nanotechnology and nanofabrication.
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The Meeting for Advanced Electron Beam Lithography - Electron Beam Lithography, Electron Beam Lithography, E-Beam Lithography, Nanotechnology
... The Meeting for Advanced Electron Beam Lithography - Electron Beam Lithography, Electron Beam Lithography, E-Beam Lithography, ...
Dortmund, Germany
51-100 Employees
1980
Raith is a leading precision technology manufacturer for nanofabrication, electron beam lithography, FIB SEM nanofabrication, laser lithography, nanoengineering, and reverse engineering applications. What makes Raith unique is the range of its nanofabrication products and services, covering high-end systems for productive and industrial applications right through to highly flexible solutions for budget-conscious academic research. Raith’s broad nanofabrication portfolio offers the ideal solution for all your nanofabrication challenges. Raith employees and management are committed to provide their clients with innovative product solutions as part of a lifelong partnership. To achieve this, we are committed to our defined values:. Raith customers are found above all in universities and in publicly funded research institutions, specializing in basic and materials research on nanoscale level. Beyond this, Raith solutions are also deployed in research and development departments of industry in areas such as prototyping of nanotechnology-based products and processes. Raith was founded in Dortmund, Germany, in 1980.
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Electron column for electron beam lithography and imaging
... Electron column for electron beam lithography and imaging ...
Wellesley, United States
51-100 Employees
STS-Elionix is a partnership that delivers state-of-the-art nanotechnology products throughout North America and Europe. STS-Elionix is a partnership dedicated to delivering state-of-the-art nanotechnology products throughout North America and Europe. The Elionix electron beam lithography (EBL) systems are built to meet customer demands for finer lines and writing speeds. SEMTech Solutions (STS), incorporated in 2000, has sold hundreds of electron beam products to the scanning electron microscopy (SEM) industry. Our main emphasis is the refurbishment and service of scanning electron microscopes (SEMs) worldwide. Since 1975, Elionix has been manufacturing, installing, and servicing Electron Beam Lithography (EBL) systems.
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Electron Beam Lithography Systems | Nanofabrication of Quantum Devices
... STS-Elionix is a partnership that provides electron beam lithography systems to leading research institutions, national labs, and private companies. ...
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Electron Beam Lithography Contributions from Jena
... Electron Beam Lithography Contributions from Jena – Verlag ...
Jena, Germany
51-100 Employees
1996
Vistec Electron Beam GmbH provides leading technology solutions for advanced electron-beam lithography. Based on the statistics gathered, we can improve our offerings and make them more interesting to you as the user. As a long-standing equipment supplier, Vistec Electron Beam, Jena (Germany) is providing leading technology solutions for advanced electron-beam lithography. Vistec’s technology features automated handling, as well as high flexibility, writing accuracy and productivity enabling prototyping and low volume manufacturing. Vistec Electron Beam GmbH develops, manufactures, sales and services 50kV Variable Shaped Beam lithography systems, which serve customers in both, semiconductor industry as well as advanced research, optics and several emerging markets.
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electron beam lithography: Vistec - We understand E-Beam.
... electron beam lithography: Vistec - We understand E-Beam. ...
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ConScience AB
... Large-area and high-resolution electron beam lithography ...
United States
11-50 Employees
2010
We provide chipmakers with what they need – hardware, software and services – to produce patterns on silicon through direct-write lithography. Headquartered in Santa Clara, California, Multibeam engages in the design, manufacture, and sales of multi-column electron-beam lithography (MEBL) systems that enable maskless production of integrated circuits (ICs) with on-chip security, rapid prototyping, heterogeneous chiplet integration, silicon photonics, and other emerging applications. At the heart of Multibeam technology is an array of miniature e-beam columns that provide a maskless and high-throughput platform for writing nanoscale IC patterns seamlessly across full wafers. Multibeam will present High-productivity maskless patterning at the deep submicron scale: An overview of Multibeam’s multicolumn e-beam lithography system at the 2024 SPIE Advanced Litho + Patterning conference.
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Home - Multibeam
... Multibeam engages in the design, manufacture, and sales of multi-column electron-beam lithography (MEBL) systems that enable maskless production of integrated circuits (ICs) for numerous applications including on-chip security, rapid prototyping, heterogeneous chiplet integration, silicon ...
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Some interesting numbers and facts about the results you have just received for Electron Beam Lithography
| Country with most fitting companies | United States |
| Amount of fitting manufacturers | 11 |
| Amount of suitable service providers | 7 |
| Average amount of employees | 11-50 |
| Oldest suiting company | 1980 |
| Youngest suiting company | 2019 |
Electron Beam Lithography (EBL) is a sophisticated technique used for creating extremely fine patterns on the surface of a material, with applications primarily in the fabrication of microprocessors and integrated circuits. This method employs a focused beam of electrons to draw custom or pre-designed patterns directly onto a substrate coated with an electron-sensitive film known as a resist. The interaction between the electron beam and the resist alters the chemical structure of the latter, enabling selective removal of either the exposed or unexposed regions of the resist by a process called development. The primary advantage of EBL over traditional photolithography lies in its ability to produce features down to a few nanometers in size, offering unparalleled precision that is crucial for the advancement of nanotechnology and semiconductor manufacturing. Its capacity for intricate patterning makes it an indispensable tool in the research and development of quantum computing, nano-electromechanical systems (NEMS), and other applications where minute scale and precision are paramount. However, the technique's relatively slow speed, due to the sequential nature of the electron beam scanning process, and high cost limit its use to primarily low-volume production or research purposes. Despite these challenges, the critical role of EBL in pushing the boundaries of miniaturization and complexity in electronics underscores its significance in the continual evolution of technology.
1. Precision and Resolution
Electron beam lithography offers unparalleled precision and resolution, capable of patterning features down to a few nanometers. This level of detail surpasses that of traditional photolithography, making electron beam lithography ideal for applications requiring extreme miniaturization, such as semiconductor manufacturing and nanotechnology.
2. Flexibility in Pattern Design
Unlike photolithography, which uses masks to replicate patterns, electron beam lithography allows for direct writing onto the substrate. This process eliminates the need for masks, offering greater flexibility in pattern design and simplification of the prototyping process. Design changes can be made quickly and efficiently, significantly reducing development time and costs.
3. Material Versatility
Electron beam lithography can be employed on a wide range of materials, including insulators and semiconductors, without the need for special treatments to improve conductivity. This versatility opens up a broader spectrum of applications, from electronics to novel material research, providing designers and researchers with more creative freedom and experimental scope.
1. Resolution Capabilities
Ensure the supplier's electron beam lithography (EBL) systems can achieve the high resolution necessary for your specific applications, ideally below 10 nanometers.
2. Throughput Efficiency
Evaluate the system's speed and throughput capabilities to ensure it meets your production timelines and volume requirements.
3. System Flexibility
Check if the EBL system offers flexibility in terms of substrate size and shape, allowing for a variety of applications and projects.
4. Software Compatibility
Confirm that the EBL system's software is compatible with your design tools and offers intuitive operation for pattern generation and modification.
5. After-Sales Support
Assess the level of technical support and maintenance services provided post-purchase to ensure reliable operation and minimal downtime.
6. Cost Efficiency
Consider the total cost of ownership, including initial investment, consumables, and ongoing maintenance, to ensure it aligns with your budget and provides value over time.
Electron beam lithography (EBL) plays a crucial role in the semiconductor industry, where it's employed for the creation of highly intricate patterns on silicon wafers. This precision enables the manufacture of microprocessors and memory chips with increasingly smaller features, meeting the demand for faster and more efficient electronic devices. The ability to craft features at the nanometer scale makes EBL indispensable for the development of next-generation computing technology. In the field of photonics, EBL finds significant application in fabricating photonic crystals and nano-scale optical components. These components are essential for developing advanced optical communication systems, offering improved data transmission rates and reduced energy consumption. By leveraging EBL, companies can produce devices with precise control over light-matter interaction, paving the way for innovations in high-speed internet and telecommunications. Another vital B2B use case for EBL is in the fabrication of nanoscale biosensors. These devices are fundamental in medical diagnostics, environmental monitoring, and bioengineering, providing high sensitivity and specificity for detecting biological molecules. EBL's ability to produce extremely small and accurate patterns allows for the development of biosensors with enhanced performance, contributing to advancements in healthcare and biotechnology sectors. Electron beam lithography also finds application in the development of quantum computing components. Its precision allows for the creation of quantum dots and other nanostructures that are critical for quantum bit (qubit) implementation. This capability is key for businesses investing in quantum computing research, offering a pathway to building more powerful and efficient computing systems.
Electron Beam Lithography (EBL) is positioned at a high Technology Readiness Level (TRL), typically at TRL 8 or 9, indicating that it is fully developed and validated in real-world environments. This advanced placement is attributable to EBL's precision and versatility in creating extremely fine patterns, essential for the fabrication of micro- and nanoscale devices. A critical factor underpinning its high TRL is the extensive research and development that has matured the technology, enabling the direct writing of patterns with resolutions down to a few nanometers. This capability is pivotal for the semiconductor industry and advanced material science applications, where the demand for miniaturization and high-density patterns is incessant. Additionally, the technology's integration into various manufacturing processes, coupled with a robust ecosystem of equipment suppliers and technical know-how, consolidates its readiness for widespread industrial application. However, the high energy consumption, slow throughput compared to other lithography techniques, and the need for a vacuum environment are technical challenges that have been largely addressed through incremental innovations, further cementing EBL's status at the apex of the TRL scale.
In the Short-Term, we anticipate significant improvements in electron beam lithography (EBL) resolution and throughput. Advances in beam shaping and control are expected to reduce feature sizes further, enabling more precise patterning capabilities. This phase will likely see the development of software enhancements that streamline the EBL process, reducing design-to-production times and making it more cost-effective for small to medium-sized production runs. During the Mid-Term phase, the focus will shift towards integrating multi-beam technologies, substantially increasing the throughput of EBL systems. This development aims to bridge the gap between EBL's high resolution and the high-volume production demands of the semiconductor industry. Additionally, there will be a concerted effort to reduce the energy consumption of EBL systems, aligning with the industry's broader sustainability goals. In the Long-Term, we forecast the emergence of groundbreaking EBL methodologies that could revolutionize nanofabrication. Innovations such as the use of novel electron-sensitive materials and the exploration of extreme ultraviolet (EUV) lithography in conjunction with EBL techniques are expected. These advancements will likely usher in a new era of nanomanufacturing, enabling the creation of devices and structures at the atomic scale, further pushing the boundaries of what is technologically feasible.
