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Allresist GmbH
Strausberg, Germany
A
1-10 Employees
1992
Key takeaway
The company specializes in the development, production, and distribution of photoresists for optical and electron beam lithography, along with related process chemicals for electronic component manufacturing. They emphasize high product quality and reliable delivery, ensuring effective workflows, particularly highlighting their expertise with E-Beam resists like AR-N 7520.
Reference
Product
Photoresist - Allresist DE
Photoresist
EM Resist
Macclesfield, United Kingdom
A
1-10 Employees
2011
Key takeaway
EM Resist specializes in photoresists, offering a diverse range including HSQ, PMMA, and SU-8, along with ancillary solvents and technical support, ensuring high-quality materials for nanolithography applications. Their in-house manufacturing and dedicated R&D laboratory further enhance their capability to meet specific customer needs.
Reference
Core business
EM Resist - Specialists in Resist Technology
EM Resist specialises in resists for nanolithography applications. We offer a range of resist materials from HSQ to PMMA, ancillary solvents and technical support. Get in touch to discuss your application.
EMS
United States
B
11-50 Employees
-
Key takeaway
Nagase ChemteX America LLC specializes in formulating and manufacturing adhesives and conductives, which may include photoresist materials. Their commitment to designing specific solutions for diverse applications positions them as a key player in the microelectronics market.
Reference
Product
Photoresist | Nagase ChemteX
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micro resist technology GmbH
Berlin, Germany
A
51-100 Employees
1993
Key takeaway
The company specializes in the development and distribution of innovative photoresists and related materials for micro- and nanostructuring, highlighting their ability to customize products to meet specific customer needs. Their portfolio includes various types of photoresists, including positive and negative options, as well as materials for inkjet printing applications.
Reference
Product
mr-DevCH – micro resist technology
Electra Polymers
Tonbridge and Malling, United Kingdom
A
101-250 Employees
1984
Key takeaway
Electra Polymers specializes in advanced specialty polymer products, including the ETP240 Photoimageable Acid Etch Resist, which is designed for high-density multi-layer PCB manufacturing. This product offers a cost-effective alternative to dry film resist, highlighting the company's expertise in photoresist technology.
Reference
Product
ETP240 Photoimageable Acid Etch Resist - Electra Polymers
ETP240 is a contact exposure, negative working photoimageable etch resist, formulated for roller or dip coating as a cost effective alternative to dry film-resist in the manufacture of high density multi-layer PCBs. After acid etching it is easily removed in a sodium hydroxide solution or proprietary resist strippers.
Eternal Technology Corporation
Colonial Heights, United States
B
11-50 Employees
1998
Key takeaway
Eternal's dry film photoresist is essential for the image transfer process, making it ideal for precision etching and electroplating in various applications, including printed circuit boards. Their strong R&D capabilities enable the development of tailored dry film products that meet specific customer needs in advanced manufacturing processes.
Reference
Core business
About Us — Eternal Technology Corporation
HiTech Photopolymere AG
Basel, Switzerland
A
1-10 Employees
1997
Key takeaway
HTP HiTech Photopolymere AG specializes in the development of advanced liquid photoresist formulations, which are essential for etching various metals and manufacturing high-end flexible circuits. Their expertise and experience in photochemistry position them as a key player in the photoresist market.
Reference
Core business
HTP HiTech Photopolymere for etching applications
SPS-International
Putten, Netherlands
A
11-50 Employees
1988
Key takeaway
SPS offers K-PRO™ photoresists, which are advanced packaging positive resists suitable for i-line, g-line, and broadband packaging applications, making them highly relevant for photolithography processes.
Reference
Product
K-PRO™ photoresists
K-PRO™ photoresists are advanced packaging positive resists for use in i-line, g-line and broadband packaging applications.
Paramtronics
Mumbai, India
D
1-10 Employees
2013
Key takeaway
The company, SunAnshul Technologies Pvt Ltd, provides a range of high-performing materials for industries including electronics assembly and semiconductor packaging. Notably, they offer Etch and Plating Resist UV and Thermal Ink, which is relevant to the photoresist query.
Reference
Product
Etch and Plating Resist UV and Thermal Ink - Paramtronics
Irresistible Materials
Birmingham, United Kingdom
A
11-50 Employees
2010
Key takeaway
Irresistible Materials Ltd is focused on developing innovative photoresist materials for next-generation lithography, including EUV and E-beam resists. The company has built a strong patent portfolio in this area, highlighting its expertise and commitment to advancing lithography technologies.
Reference
Product
Electron Beam Resist – Irresistible Materials
Technologies which have been searched by others and may be interesting for you:
Photoresist is a light-sensitive material used in various manufacturing processes, particularly in semiconductor and microfabrication industries. It plays a critical role in photolithography, a technique where patterns are transferred onto a substrate. When exposed to light, photoresist undergoes a chemical change that alters its solubility, allowing selective removal of either the exposed or unexposed areas. This process is essential for creating intricate circuit designs on chips and other electronic components. The effectiveness of photoresist greatly influences the resolution and accuracy of the final product, making it a vital component in advanced manufacturing technologies.
Photoresist plays a crucial role in semiconductor manufacturing by acting as a light-sensitive material used in the photolithography process. During this process, a layer of photoresist is applied to the semiconductor wafer. When exposed to ultraviolet (UV) light through a photomask, the photoresist undergoes a chemical change that allows selective etching or deposition of materials. After exposure, the wafer is developed, removing either the exposed or unexposed areas of the photoresist, depending on whether a positive or negative photoresist is used. This creates intricate patterns on the wafer that define electronic circuits and components. The precision and quality of photoresist are vital for achieving the desired feature sizes and ensuring the performance of the final semiconductor devices.
1. Positive Photoresist
This type of photoresist becomes soluble when exposed to light. It allows for the selective removal of material, making it ideal for applications in semiconductor manufacturing and microfabrication.
2. Negative Photoresist
Negative photoresist is the opposite of positive types; it becomes insoluble when exposed to light. This characteristic enables it to form relief patterns, which are useful in various applications, including printed circuit board production.
3. Thick Photoresist
Thick photoresist is designed for applications requiring greater coating thickness. It is often used in applications like micro-electromechanical systems (MEMS) where deeper etching is necessary.
4. Thin Photoresist
Thin photoresist is commonly used for high-resolution patterns in semiconductor fabrication. Its low viscosity allows for fine detail and improved feature resolution.
5. Laser Direct Imaging Photoresist
This specialized photoresist is used in laser direct imaging processes. It offers high precision and is suitable for advanced applications in electronics and photonics.
The performance of photoresist is influenced by several key factors.
1. Film Thickness
The thickness of the photoresist layer plays a critical role in its performance. Thicker films can absorb more light, impacting the resolution and the ability to accurately define small features.
2. Exposure Conditions
The wavelength of the light used for exposure affects the photoresist's sensitivity and resolution. Different types of photoresists are designed for specific wavelengths, which can optimize performance based on the exposure source.
3. Development Process
The development process, including the developer chemistry and time, significantly impacts the final pattern resolution and profile. Proper control of these parameters ensures the desired feature sizes and shapes are achieved.
4. Material Composition
The chemical structure and composition of the photoresist determine its properties such as sensitivity, contrast, and adhesion. Tailoring these materials can enhance performance for specific applications.
5. Environmental Conditions
Factors like temperature, humidity, and even ambient light during processing can affect the stability and performance of photoresist. Maintaining controlled conditions ensures consistent results.
6. Substrate Interaction
The interaction between the photoresist and the substrate can influence adhesion and pattern transfer. A suitable choice of materials and surface treatment can enhance performance and yield.
Photoresist plays a crucial role in the lithography process by acting as a light-sensitive material that is applied to the substrate. When exposed to specific wavelengths of light during the exposure step, the photoresist undergoes a chemical change. This transformation allows for selective removal of either the exposed or unexposed areas in the development stage, depending on whether a positive or negative photoresist is used. The effectiveness of photoresist directly impacts the resolution and accuracy of the patterns created on semiconductor wafers. By enabling precise control over the pattern transfer, photoresist contributes significantly to the production of microelectronic devices, ensuring that intricate designs are faithfully reproduced on the substrate.
Some interesting numbers and facts about your company results for Photoresist
| Country with most fitting companies | United States |
| Amount of fitting manufacturers | 5571 |
| Amount of suitable service providers | 3673 |
| Average amount of employees | 11-50 |
| Oldest suiting company | 1984 |
| Youngest suiting company | 2013 |
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Some interesting questions that has been asked about the results you have just received for Photoresist
What are related technologies to Photoresist?
Based on our calculations related technologies to Photoresist are Glass, Superconductors, High-Performance Materials, Raw Materials, Phase Change Materials
Which industries are mostly working on Photoresist?
The most represented industries which are working in Photoresist are Other, Electronics and Electrical engineering, Printing, Chemicals, Plastics
How does ensun find these Photoresist Suppliers?
ensun uses an advanced search and ranking system capable of sifting through millions of companies and hundreds of millions of products and services to identify suitable matches. This is achieved by leveraging cutting-edge technologies, including Artificial Intelligence.
