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Axus Technology
Chandler, United States
B
51-100 Employees
2002
Key takeaway
Axus Technology specializes in providing advanced technical solutions for Chemical Mechanical Polishing (CMP) processes, offering services that range from CMP process development to production foundry services. Their expertise ensures effective removal of slurry residues and polish byproducts, which are crucial for the subsequent processing of wafers.
Reference
Product
Equipment - AxusTech
SPS-International
Putten, Netherlands
A
11-50 Employees
1988
Key takeaway
SPS is a key player in semiconductor production systems, highlighting their expertise in Chemical Mechanical Polishing (CMP), which is recognized as a leading method for planarization in the industry.
Reference
Core business
SPS-International » About us » CMP
Chemical mechanical polishing CMP has become the best choice for global and local planarization.
Fraunhofer IPMS
-
251-500 Employees
2003
Key takeaway
The company's expertise includes the development of components and technologies in the field of Micro (Opto) Electro-Mechanical Systems (MEMS and MOEMS), which encompasses services for Chemical Mechanical Polishing (CMP).
Reference
Service
Chemisch-mechanisches Polieren (CMP) - Fraunhofer IPMS
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Ebara Technologies
Sacramento, United States
B
51-100 Employees
1912
Key takeaway
EBARA Technologies Inc. offers advanced Chemical Mechanical Planarization (CMP) Systems, designed to meet the challenges of modern semiconductor manufacturing. Their systems are equipped with industry-leading technology options, suitable for planarizing various materials across different technology nodes.
Reference
Product
Chemical Mechanical Planarization Systems - Ebara Technologies Inc.
EBARA’s Applications Engineering groups in Japan and the U.S. continue to push the envelope required for tomorrow's devices. Whether this entails planarizing exotic new materials or providing proven solutions for today’s Copper, Oxide, Tungsten, or STI challenges across an array of technology nodes and device types, EBARA has a CMP system with industry leading technology options to meet your requirements. EBARA is recognized as the benchmark for industry leading production and reliability standards and has been rewarded with continued year-over-year market share growth.
Logitech Limited
Glasgow, United Kingdom
A
11-50 Employees
1965
Key takeaway
Logitech is a leader in precision sawing, lapping, and polishing equipment, including their Tribo CMP System, which is specifically designed for Chemical Mechanical Polishing (CMP) applications in semiconductor manufacturing. Their systems are developed to enhance the quality of processing for various wafer and substrate materials.
Reference
Product
Tribo CMP System | Chemcial Mechanical Polishing | Logitech LTD
Tribo CMP System is suitable for a wide variety of wafer/substrate materials used in today's device fabrication processes.
PT GK Industry
Sukolilo Barat, Indonesia
D
1-10 Employees
2014
Key takeaway
The company offers a comprehensive selection of high-quality machinery and chemical solutions for surface finishing industries, which likely includes Chemical Mechanical Polishing (CMP) machines. Their commitment to technical support and strong customer partnerships enhances production processes.
Reference
Product
Product categories Polishing | Chemicals & Machinery
Jotun Polishing Machine
Hefei, China
D
11-50 Employees
2013
Key takeaway
The company specializes in automatic polishing solutions that enhance productivity and output quality, which could be relevant for those seeking efficient Chemical Mechanical Polishing (CMP) machines. Their experience in metal surface polishing and a range of polishing equipment suggests a commitment to advanced polishing technologies.
Reference
Product
China polished machine provider 丨 suppling various polishing equipment
Jotun provides polishing equipment and deburring machines, covering a variety of uses. Mechanical polishing technology service provider.
MMP ELECTROVIBE UK LIMITED
Portsmouth, United Kingdom
A
1-10 Employees
-
Key takeaway
MMP Polishers, with over 33 years of experience in mechanical and electrochemical polishing, offers a range of services including mechanical polishing and electropolishing. Their expertise in providing high-quality finishes across various industries, such as Pharmaceutical and Petrochemical, highlights their capability in advanced polishing techniques.
Reference
Service
MMP Electrovibe | Services
International Conference on Planarization Technology 2022
Portland, United States
B
1001-5000 Employees
2022
Key takeaway
The Center for Advanced Materials Processing (C.A.M.P.) highlights the International Conference on Planarization Technology (ICPT) 2022, which serves as a key platform for sharing advancements in Chemical Mechanical Polishing (CMP) technology. Notably, Matthew Prince, an Intel Fellow, leads the development of CMP processes at Intel, bringing over three decades of innovation and expertise to the field.
Reference
Core business
Home | International Conference on Planarization Technology 2022
The International Conference on Planarization Technology (ICPT) is an annual multiple-day, high-level conference covering all aspects of CMP technology as it is used in nearly countless applications. The foundation of the ICPT is strongly based within the co-operation of the CMP Users Groups of China, Europe, Japan, Korea, Taiwan and the United States.
Gigamat Technologies, Inc.
Fremont, United States
B
11-50 Employees
2002
Key takeaway
GigaMat Technologies offers a robust Chemical Mechanical Polishing (CMP) machine, designed for longer and more rigorous polishing, making it ideal for wafer manufacturers. Their integrated system includes various components that enhance the CMP process, ensuring high production output and reliability.
Reference
Core business
About GigaMat Technologies — GigaMat Technologies, Inc.
GigaMat support worldwide customer. Installed base in USA, Europe, Taiwan, China, Korea, Singapore, India…. The Company’s polishers have been used on a variety of materials such as Sic, silicon, lithium niabate, sapphire, quartz, and GaAs…. The GigaMat polisher is a true workhorse, and the design a
Technologies which have been searched by others and may be interesting for you:
Chemical Mechanical Polishing (CMP) machines are advanced equipment used in semiconductor manufacturing and other precision industries to achieve ultra-smooth surfaces on wafers and substrates. These machines combine both chemical and mechanical processes to remove material from the surface effectively. The chemical component typically involves a slurry that contains abrasive particles and specific chemicals, while the mechanical aspect involves polishing pads that physically interact with the substrate. The primary objective of CMP is to planarize surfaces, ensuring uniformity and minimizing defects that can affect the performance of electronic devices. By utilizing CMP machines, manufacturers can enhance the quality of their products, making them essential in the production of integrated circuits and other high-tech applications. The precision and efficiency of these machines contribute significantly to advancements in technology.
A Chemical Mechanical Polishing (CMP) Machine operates by combining chemical and mechanical processes to achieve a smooth surface on semiconductor wafers. The process begins with a polishing pad that is saturated with a chemical slurry, which contains abrasives and reactive chemical agents. As the wafer is pressed against the pad, the mechanical action of the pad's surface removes material from the wafer while the chemicals in the slurry enhance the material removal rate and improve surface quality. The machine typically features a rotating table where the wafer is placed, and the pad rotates simultaneously. This dual action helps ensure uniform polishing across the wafer's surface. The controlled combination of pressure, speed, and chemical composition is crucial for achieving the desired finish, making CMP an essential step in semiconductor fabrication for producing flat and defect-free surfaces.
A Chemical Mechanical Polishing (CMP) Machine is essential in semiconductor manufacturing, known for its precision in surface finishing. One of its key features is the dual action mechanism, which combines both chemical and mechanical processes to achieve a flat and smooth surface on wafers. This allows for improved planarity, essential for advanced lithography. Another significant feature is process control capabilities. These machines often include sophisticated sensors and software that monitor and adjust parameters like pressure, speed, and slurry flow in real-time. This ensures consistent performance and high yields while minimizing defects on the polished surfaces.
Chemical Mechanical Polishing (CMP) Machines are versatile tools primarily used in the semiconductor industry for polishing and planarizing various materials. They can effectively process silicon wafers, which are the foundational components in semiconductor manufacturing. Additionally, dielectrics such as silicon dioxide and silicon nitride can be polished to achieve smooth surfaces necessary for further fabrication processes. Metals like copper and aluminum are also suitable for CMP, allowing for the creation of flat, defect-free surfaces essential for interconnect formation in microelectronics. Overall, CMP technology facilitates the processing of a wide range of materials, enhancing the performance and reliability of electronic devices.
Chemical Mechanical Polishing (CMP) Machines are widely utilized in various industries, particularly in semiconductor manufacturing. In this sector, CMP is essential for achieving the flatness and smoothness required for advanced integrated circuits. Additionally, the electronics industry employs CMP machines for polishing substrates used in devices such as smartphones and tablets. The optical industry also benefits from these machines, as they help in refining glass and other optical components to meet precise specifications. Furthermore, the aerospace and automotive sectors use CMP processes to enhance the surface quality of materials, ensuring optimal performance and durability.
Some interesting numbers and facts about your company results for Chemical Mechanical Polishing (CMP) Machine
| Country with most fitting companies | United States |
| Amount of fitting manufacturers | 5618 |
| Amount of suitable service providers | 5240 |
| Average amount of employees | 11-50 |
| Oldest suiting company | 1912 |
| Youngest suiting company | 2022 |
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Some interesting questions that has been asked about the results you have just received for Chemical Mechanical Polishing (CMP) Machine
What are related technologies to Chemical Mechanical Polishing (CMP) Machine?
Based on our calculations related technologies to Chemical Mechanical Polishing (CMP) Machine are Industrial Electroplating, Industrial Filtration, Industrial Sintering, Industrial Extrusion, Industrial Handling
Which industries are mostly working on Chemical Mechanical Polishing (CMP) Machine?
The most represented industries which are working in Chemical Mechanical Polishing (CMP) Machine are Machinery Manufacturing, Other, Manufacturing, Chemicals, Mining
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